Photocatalytic thin Films Prepared by Plasma Curing of Non‐Reactive Siloxane Dispersions Containing TiO2 Particles
Photocatalytic TiO\u003csub\u003e2\u003c/sub\u003e layers prepared by PVD or CVD processes are already produced industrially. The deposited TiO\u003csub\u003e2\u003c/sub\u003e needs a sufficiently high concentration of the photocatalytically active anatase phase which is produced at higher substrate temperature. As a consequence, the PVD/CVD techniques are limited to heat‐resistant substrates.