冷凝

Abstract(#br)Novel titania and hafnia structures on top of silica wafer were produced using atomic layer deposition through the accessible pores created by a patterned polydimethylsiloxane (PDMS) stamp in conformal contact. Typically, the processing temperature was in the range of 125\u003cce:hsp sp=\"0.25\"/\u003e°C in order to avoid damaging the stamp and also to create an amorphous metal oxide deposit. Interestingly, the deposit formation tended to be dominated by condensation of the metal oxide precursor and water in the vicinity of the contact edges of the stamp and substrate.

Abstract(#br)Four polydimethylsiloxane (PDMS) coatings with different surface free energies have been prepared and applied to smooth and roughened aluminum plates to form hydrophobic and superhydrophobic surfaces. Their surface wettability in terms of water contact angle (CA), sliding angle (SA) and water droplet impact dynamics was studied under an ambient (50% relative humidity, RH at 25\u003cce:hsp sp=\"0.25\"/\u003e°C) and three different condensing environments (low, highly and extremely condensing, i.e. 30%, 60% and 90% RH at −10\u003cce:hsp sp=\"0.25\"/\u003e°C).