Surface studies on benzophenone doped PDMS microstructures fabricated using KrF excimer laser direct write lithography
Abstract(#br)This paper discusses microfabrication process for benzophenone doped polydimethylsiloxane (PDMS) using laser lithography. KrF excimer laser of 248\u003cce:hsp sp=\"0.25\"/\u003enm with 20\u003cce:hsp sp=\"0.25\"/\u003ens pulse width at repetition rate of 1\u003cce:hsp sp=\"0.25\"/\u003eHz was used for microfabrication of undoped and benzophenone doped PDMS. The doped-PDMS shows sensitivity below 365\u003cce:hsp sp=\"0.25\"/\u003enm, permitting processing under ambient light.