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TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process

ty10086 提交于 周四, 08/26/2021 - 13:22
Abstract(#br)Atomic layer deposition (ALD) surges as an attractive technology to deposit thin films on different substrates for many advanced biomedical applications. Herein titanium dioxide (TiO 2 ) thin films were successful obtained on polyurethane (PU) and polydimethylsiloxane (PDMS) substrates using ALD. The effect of TiO 2 films on Candida albicans growth and inactivation process were also systematic discussed. TiCl 4 and H 2 O were used as precursors at 80\u003cce:hsp sp=\"0.25\"/\u003e°C, while the reaction cycle number ranged from 500 to 2000.