Fabrication of Superhydrophobic Film with Uniform Structures Using Two Step Lithography and Nanosilica Coating
Fabrication of Superhydrophobic Film with Uniform Structures Using Two Step Lithography and Nanosilica CoatingTwo step lithography;Edge beads;Superhydrophobic;Transparent;Flexible;We propose a two-step lithography process to minimize edge-bead issues caused by thick photoresist (PR) coating. In the conventional PR process, the edge bead can be efficiently removed by applying an edge-bead removal (EBR) process while rotating the silicon wafer at a high speed.