Programming matter through strain
Abstract(#br)We describe the use of light in a lithographic form of grayscale patterning as a means to program the properties and folding mechanics of flat, thin-film-polymeric materials. In this process, a finely dispersed (phase-separated) mixture of photoresist (SU-8 50) in polydimethylsiloxane (PDMS) is irradiated with ultraviolet light through a photomask. The subsequent photoresist cross-linking in the exposed regions causes changes in the material’s chemo-mechanical properties (notably making it stiffer and more resistant to solvent-induced swelling in the area of exposure).